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脉冲激光沉积法制备La0.5Sr0.5CoO3薄膜及其结构和表面特性 预览 被引量:2

Structure and Surface Characteristics of La0.5Sr0.5CoO3 Thin Films Prepared by Pulsed-Laser Deposition
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摘要 利用脉冲激光沉积法在(001)取向的LaAlO3(LAO)衬底上实现了La0.5Sr0.5CoO3(LSCO)薄膜的外延生长.主要研究了衬底温度(Ts),激光能量(El)和氧气压强(pO2)对薄膜结构和表面形貌的影响.X射线衍射结果显示在Ts=700~850 ℃的范围内沉积的LSCO薄膜都具有c轴取向.从扫描电子显微镜和原子力显微镜照片可以看出上述3个沉积参数中,氧压对LSCO薄膜表面形貌的影响最为显著,较低氧压下沉积的薄膜具有较光滑的表面.通过实验,确立了能够制备同时具有c轴取向和光滑表面的薄膜的最佳沉积参数范围. A deposition parameters study of the epitaxial growth of La(0.5)Sr(0.5)CoO3(LSCO) thin films on LaAlO3 (001) substrates by pulsed-laser deposition (PLD) is reported. Films are grown under different substrate temperatures (700-850 ℃), oxygen pressures (2-80 Pa), and incident laser energies (150-450 mJ). The results of X-ray diffraction (XRD) measurements show that LSCO films deposited at substrate temperature range 700-850 ℃ are c-axis oriented. Scanning electron microscopy(SEM) and atomic force microscopy (AFM) images reveal that of all the deposition parameters, oxygen pressure has the most remarkable influence on the surface morphology of LSCO films. The film deposited at lower oxygen pressure has a smoother surface. The optimal ranges of substrate temperature, oxygen pressure and laser energy to produce c-axis oriented films with smooth surface and high metallic conductivity are identified.
作者 刘建 李美亚 官文杰 国世上 赵兴中 LIU Jian, LI Mei-ya, GUAN Wen-jie, GUO Shi-shang, ZHAO Xing-zhong(School of Physics and Technology, Wuhan University, Wuhan 430072, Hubei, China)
机构地区 武汉大学
出处 《武汉大学学报:理学版》 CAS CSCD 北大核心 2004年第3期 320-324,共5页 JOurnal of Wuhan University:Natural Science Edition
基金 国家自然科学基金
关键词 La0.5Sr0.5CoO3 外延生长 脉冲激光沉积 薄膜 La(0.5)Sr(0.5)CoO3 epitaxial growth pulsed-laser deposition (PLD) thin films
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