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不同溅射功率制备的Zn0.97Co0.03O薄膜的结构和光学性质研究 预览

Microstructure and optical properties of Zn0.97 Co0.03 O Thin films prepared using magnetron sputtering at different sputtering power
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摘要 采用磁控溅射法在不同射频功率下制备了Zn0.97Co0.03O薄膜。利用X射线衍射(XRD)、拉曼光谱(Raman)、紫外-可见光谱和室温光致发光谱对薄膜进行了表征。XRD和Raman结果表明,Zn0.97Co0.03O薄膜为六方纤锌矿结构,沿(002)晶面择优取向。随着溅射功率的增大,薄膜的(002)晶面择优取向增强,晶化程度提高,晶粒尺寸增大。不同溅射功率制备的Zn0.97Co0.03O薄膜均具有较高的可见光透过率。随溅射功率增加,光学带隙减小,光吸收边红移。光致发光谱表明不同溅射功率制备的Zn0.97Co0.03O薄膜均具有较强的带边紫外发光峰。随着溅射功率的增加,该发光峰的峰位发生红移,且峰强度增强。以上研究结果表明,溅射功率对Zn0.97Co0.03O薄膜的生长速率、结晶质量及光学性能有明显影响,但不会影响薄膜的成分。 Zn0.97 Co0.03 O thin films were prepared by magnetron sputtering at different RF sputtering power.The films were characterized by X ray diffraction(XRD),Raman spectroscopy(Raman),UV-Vis spectroscopy and room temperature photoluminescence.The results of XRD and Raman show that the Zn0.97 Co0.03 O thin films possess hexagonal wurtzite structure with preferred orientation of(002)along the c-axis perpendicular to the substrate.With the increase of RF sputtering power,the preferred orientation of(002)crystal faces is obviously enhanced,the degree of crystallization is increased,and the grain size is increased.The Zn0.97 Co0.03 O films prepared with different RF sputtering power have higher visible light transmittance.As the RF sputtering power increases,the optical band gap decreases,and the light absorption edge appears red shift.The room temperature photoluminescence spectrum shows that the Zn0.97 Co0.03 O films prepared by different RF sputtering power have strong band edge ultraviolet emission peak.The peak position is red shifted and the peak intensity increases with the RF sputtering power increases.The above results show that the sputtering power has a significant effect on the growth rate,crystal quality and optical properties of Zn0.97 Co0.03 O films,but has little effect on the composition of the films.
作者 阳生红 蒋志洁 张曰理 YANG Shenghong;JIANG Zhijie;ZHANG Yueli(School of Physics,Sun Yat-sen University,Guangzhou 510275,China;School of Materials and Engineering,Sun Yat-sen University,Guangzhou 510275,China)
出处 《电子元件与材料》 CAS CSCD 北大核心 2019年第1期23-27,共5页 Electronic Components And Materials
基金 国家自然科学基金资助项目(61176010 1172027).
关键词 Zn0.97Co0.03O薄膜 磁控溅射 溅射功率 结构 可见光透过率 光致发光 Zn0.97 Co0.03 O thin films magnetron sputtering sputtering power structure visible light transmittance photoluminescence
作者简介 通讯作者:阳生红(1966-),男,广西桂林人,副教授,博士,主要从事氧化物薄膜制备与性能研究
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