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矢量光共焦扫描显微系统纳米标准样品的制备与物理测量精度 预览

Fabrication and physical measurement accuracy of nanoscalestandard samples for vector beams confocal laserscanning microscopy
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摘要 针对超分辨领域分辨率测量标准的缺失情况,本文介绍了一种用于纳米尺度分辨率测试的标准样品的设计方案和制备方法,该样品适用于矢量光共聚焦激光扫描显微系统.该设计方案包含一系列测量图案和明确的指示标记,具有测量范围宽、线宽梯级序列分布合理、制备精度高等特点.首先在非晶硅片上实现硅纳米标准样品的制备,并经过多次探索工艺,提高了测试图案的精度.光学测试结果证实该纳米标样可用于分辨率测试,同时测得矢量光共聚焦激光扫描显微镜的分辨率为96 nm(n=1.52,405 nm光源).针对硅纳米标准样品低对比度的问题,本文提供石英片上金属纳米标准样品的制备方法作为补充.纳米标准样品的实现,为点扫描式超分辨显微镜的分辨率指标提供了一种更严谨的测试途径,同时能够为显微镜的调试提供原理性指导.测试中发现纳米尺度的光学成像效果除了受到样品形貌的影响外,还受到到样品的光电物性的影响,其相互作用机理尚待进一步深入研究. Various kinds of super-resolution optical microscope techniques have been developed to break thediffraction barrier in the past decades.Confocal laser scanning microscopy is the super-resolution microscopy.Itis widely used due to high resolution and depth selectivity in obtaining images.However,there are neitheraccurate nor rigorous measurement methods with a nanoscale resolution.In order to measure the resolution ofvector beam confocal laser scanning microscopy accurately and rigorously,a nanoscale resolution standardsample is proposed and experimentally realized.This sample is composed of a series of accurate measurepatterns and a couple of arrays of triangle finding structures.It allows a wide measurement range between 40 nmto 1000 nm,and provides appropriate measurement steps and high measurement accuracy.The measurementpatterns can be efficiently figured out by using the found structures,and their structure line width can be easilycalculated.The first standard sample is produced on a piece of amorphous silicon by electron beam lithographyand inductive coupled plasma etching technology,and measured by the scanning electron microscopy.According to the test,the sample meets the requirements of accuracy for nanoscale resolution measurement.Optical testing is applied to the sample by a vector beam confocal laser scanning microscope.And the sampleshows that the resolution is 96 nm(oil immersion,refractive index 1.52)under the irradiation of 405 nmradially polarized beams,which is far beyond the diffraction barrier.Furthermore,a metal structure standardsample,which is based on a piece of indium tin oxide glass,is produced to improve the signal contrast ratio ofthe silicon standard sample.The measurement patterns are fabricated by electron beam lithography andelectron beam evaporation and made of 10 nm titanium and 100 nm gold.It works for both reflective andtransmissive confocal laser scanning microscopy,and would obtain high resolution images with a better contrastratio.These standard samples are able to test the
作者 李潇男 关国荣 刘忆琨 梁浩文 张爱琴 周建英 Li Xiao-Nan;Guan Guo-Rong;Liu Yi-Kun;Liang Hao-Wen;Zhang Ai-Qin;Zhou Jian-Ying(State Key Laboratory of Optoelectronic Materials and Technologies,Sun Yat-sen University,Guangzhou 510275,China;School of Electronic and Information Engineering,Sun Yat-sen University,Guangzhou 510275,China)
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2019年第14期358-366,共9页 Acta Physica Sinica
基金 国家自然科学基金(批准号:11534017,11704421) 中央高校基本科研业务费专项资金(批准号:16lgpy53,171gpy20,17lgjc39) 广州市科技计划(批准号:201805010004)资助的课题.
关键词 微纳加工 标准样品 超分辨 共聚焦激光扫描显微镜 micro-and nanofabrication standard sample super-resolution confocal laser scanning microscopy
作者简介 通信作者:周建英,E-mail:stszjy@mail.sysu.edu.cn.
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